Open 3D-microfabrication platform
for research applications
microFAB-3D is an ultra-high resolution 3D-printing system, based on two-photon polymerization direct laser writing technology. With a minimal feature size down to 0.2microns-wide, microFAB-3D opens new perspectives in microfluidics, micro-optics, cells culture, micro-robotics or meta-materials. Open and evolutive, microFAB-3D can be adapted to fit your needs.
Feel the power of two-photon polymerization and print features down to 200 nanometers wide! The highest resolution is achievable with any configuration of µFAB-3D, from Basic to Advanced.
Our innovative micro-printing systems rely on industrial lasers with unique characteristics, in terms of highest printing-resolution, compactness, cost-efficiency and flexibility of use. It also provides better reliability because these industrial lasers last a very long time with no need for yearly maintenance.
Unlike conventionnal 3D-printing technologies, our direct laser writing technology allows us to get rid of the traditionnal "layer-by-layer" approach. You can therefore print the most complex architectures, with no need of support material or post processing, and enhanced mechanical properties.
Our software allows you to adapt the printing resolution during the fabrication. Use a big voxel to print faster, and a smaller one to realize the complex features!
Align and print on structured substrates, or directly on the tip of optical fibers of various dimensions, at 1µm precision. Custom holders are available for unconventional ferrules or automated printing on multiple fibers.
microFAB-3D can evolve easily depending on your needs and resources. You may explore 3D-microprinting at high resolution with microFAB-3D.Standard, and upgrade it afterwards to microFAB-3D.Advanced for large range replications, Voronoï structures, a second laser, and many other features.
| System | microFAB-3D.Standard | microFAB-3D.Advanced | microFAB-3D.Advanced full options |
| Lateral writing resolution (X,Y) | Adjustable from <0.2µm to 3µm | ||
| Vertical writing resolution (Z) | Adjustable from <0.6µm to 10µm | ||
| XYZ high resolution writing range (without stitching) | 100µm | 300µm | 300µm |
| Minimal surface roughness (with anti-vibration bench) | 20nanometers | ||
| Printing speed | 100µm/s at high resolution (0.2µm), 1mm/s at lower resolution (2µm) | ||
| Stitching and replication (X,Y) | Manual. Resolution : 2µm | Automated. Precision: down to 0.7µm | Automated. Precision: down to 0.2µm |
| Stitching and replication area (X,Y) | 75×25 mm² | 100×75 mm² | 100×75 mm² |
| Maximum object height (Z) | 0.15 mm | 0.45 mm | 20 mm |
| Stitching (Z) | No | No | Precision: 0.065 µm |
| Auto-focalisation | No | Yes | Yes |
| Alignment Mode | No | Yes – Precision: 1 µm | Yes – Precision: 1 µm |
| Laser Wavelength | 532nm | 532nm | 532nm + 2nd slot available for another laser wavelength (1064nm typical, or any other laser chosen by the user) |
We use the Smart Print for the fabrication of all our next-generation solar cell prototypes, which are based on III-V and 2D materials. Having the Smart Print has changed the way we work. We have total flexibility to adapt the lithography design to the demands of each particular device or process. It offers us the flexibility of e-beam lithography, but in a cost-effective, easy to use photolithography system.
We use the Smart Print for the fabrication of all our next-generation solar cell prototypes, which are based on III-V and 2D materials. Having the Smart Print has changed the way we work. We have total flexibility to adapt the lithography design to the demands of each particular device or process. It offers us the flexibility of e-beam lithography, but in a cost-effective, easy to use photolithography system.
